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Role of oxygen in AlN sublimation growth
12
Citations
8
References
2003
Year
Materials ScienceAluminium NitrideEngineeringOxidation ResistanceCrystal Growth TechnologyAln Sublimation GrowthSurface ScienceApplied PhysicsCrystal Growth RateOxygen IsotopeAl2o3 InclusionsThermodynamicsChemistryChemical DepositionChemical KineticsChemical Vapor Deposition
The effect of oxygen on AlN sublimation growth is examined theoretically. Closed-box thermodynamic calculations predict a number of volatile Al–O compounds to be formed in the vapor at high temperatures. However, these compounds produce a negligible effect on the crystal growth rate in the temperature range of interest. The analysis also shows that Al2O3 inclusions may be generated on the AlN surface due to the presence of oxygen in the vapour. The latter effect is found to be especially pronounced at moderate temperatures. (© 2003 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
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