Publication | Closed Access
Effect of growth orientation and surface roughness on electron transport in silicon nanowires
86
Citations
23
References
2007
Year
Silicon NanowiresEngineeringSilicon On InsulatorCharge TransportSemiconductor DeviceSemiconductor NanostructuresSemiconductorsElectronic DevicesNanoscale ModelingCharge Carrier TransportPhysicsSurface RoughnessNanotechnologyElectron TransportSemiconductor MaterialNanophysicsSurface ScienceApplied PhysicsQuantum DevicesGrowth Orientation
We report a study of the effect of growth orientation and surface roughness on electron transport in small-diameter hydrogen passivated silicon nanowires (NWs). We employ a nonequilibrium Green's function technique within an $s{p}^{3}{d}^{5}{s}^{*}$ tight-binding approximation to show that band structure strongly affects current-voltage characteristics of ideal NWs, leading to current falloff at high drain bias for certain growth orientations. Surface roughness suppresses small bias conductance and current, and leads to a nonmonotonic dependence on gate bias. We also find that surface roughness results in a decrease of current with the length of a NW. The rate of the decrease depends on the growth directions and diameter. As the diameter of a NW becomes smaller, a transition of electron transport to Anderson localization regime may occur even at room temperature.
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