A rapid prototyping technique for the fabrication of solvent-resistant structures

Abstract

We demonstrate a rapid prototyping technique for the fabrication of solvent-resistant channels up to and exceeding one millimeter in height. The fabrication of channels with such dimensions by conventional lithography would be both challenging and time consuming. Furthermore, we show that this technology can be used to fabricate channels with a depth that varies linearly with distance. This technique requires only a long-wavelength ultraviolet source, a mask made by a desktop printer and a commercially available optical adhesive. We demonstrate two lithographic methods: one that fabricates channels sealed between glass plates (close-faced) and one that fabricates structures on a single plate (open-faced). The latter is fully compatible with silicon replication techniques to make fluid handling devices.