Directed Assembly of Block Copolymer Blends into Nonregular Device-Oriented Structures

TLDR

Self‑assembly produces periodic nanoscale structures, yet integrating these materials into free‑form microelectronic designs remains unclear. The authors directed ternary blends of diblock copolymers and homopolymers on chemically nanopatterned substrates to form nonregular device‑oriented structures. Redistributing homopolymer enables defect‑free assembly in regions with domain sizes differing from bulk, demonstrating that nonregular structures can be patterned with self‑assembling materials and opening new nanoscale manufacturing possibilities.

Abstract

Self-assembly is an effective strategy for the creation of periodic structures at the nanoscale. However, because microelectronic devices use free-form design principles, the insertion point of self-assembling materials into existing nanomanufacturing processes is unclear. We directed ternary blends of diblock copolymers and homopolymers that naturally form periodic arrays to assemble into nonregular device-oriented structures on chemically nanopatterned substrates. Redistribution of homopolymer facilitates the defect-free assembly in locations where the domain dimensions deviate substantially from those formed in the bulk. The ability to pattern nonregular structures using self-assembling materials creates new opportunities for nanoscale manufacturing.