Publication | Closed Access
The activation of Mg in GaN by annealing with minority-carrier injection
64
Citations
16
References
1998
Year
Inert GasWide-bandgap SemiconductorElectrical EngineeringMg AcceptorEngineeringPhysicsApplied PhysicsAluminum Gallium NitrideGan Power DeviceAdditional AnnealingGallium OxideMinority-carrier InjectionCategoryiii-v Semiconductor
The activation of a Mg acceptor in GaN, by means of annealing under minority-carrier injection, is observed at a temperature above 300 °C. This activation is carried on with hydrogen left in the layer. The p-type GaN layers activated by this treatment are repassivated by additional annealing in an open-circuit configuration even in inert gas, and then reactivated by annealing under minority-carrier injection. Hydrogen remaining in the layer seems to play a major role in this reversible phenomenon.
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