Rearrangement of ferroelectric domain structure induced by chemical etching

Abstract

The rearrangement of the domain structure induced by chemical etching has been observed in periodically poled MgO-doped stoichiometric lithium tantalate single crystals. Topographic and piezoresponse scanning probe microscopy have been used for measuring the etching relief height and domain wall position after etching. The considerable shift of the domain wall during etching by pure hydrofluoric acid has been revealed by analysis of the experimental data. We have found that the wall motion proceeded after the termination of the etching procedure. We have shown that the whole consequence of the domain wall positions during etching is recorded in the etching relief height and can be extracted with high spatial and temporal resolution.