Publication | Open Access
Characterization of Bi2Te3 and Bi2Se3 topological insulators grown by MBE on (001) GaAs substrates
43
Citations
14
References
2011
Year
EngineeringCrystal Growth TechnologyIi-vi SemiconductorPseudohexagonal Bi2te3Gaas SubstratesQuantum MaterialsMolecular Beam EpitaxyEpitaxial GrowthMaterials ScienceMaterials EngineeringElectrical EngineeringPhysicsTopological MaterialSemiconductor MaterialX-ray DiffractionApplied PhysicsCondensed Matter PhysicsTopological InsulatorThin FilmsTopological HeterostructuresBi2se3 Topological Insulators
Films of pseudohexagonal Bi2Te3, Bi2Se3 and their alloys were successfully grown by molecular beam epitaxy on GaAs (001) substrates. The growth mechanism and structural properties of these films were investigated by reflection high-energy electron diffraction, atomic force microscopy, x-ray diffraction (XRD), high-resolution transmission electron microscopy, and Raman spectroscopy and mapping. The results indicate that the epitaxial films are highly uniform and are of high crystalline quality.
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