Publication | Closed Access
Lattice distortions for arsenic in single-crystal silicon
80
Citations
15
References
1986
Year
Materials ScienceX-ray SpectroscopyEngineeringPhysicsSingle-crystal SiliconSi-to-si DistanceIntrinsic ImpurityApplied PhysicsCondensed Matter PhysicsPure SiliconSemiconductor MaterialDefect FormationX-ray-absorption Fine-structure MeasurementsAmorphous SolidSilicon On InsulatorCrystallography
Extended x-ray-absorption fine-structure measurements for 0.1, 0.7, and 7 at.% arsenic impurities in single-crystal silicon yield As-to-Si nearest-neighbor distances of 2.41 \ifmmode\pm\else\textpm\fi{} 0.02 \AA{}, which are 0.06 \AA{} (2.5%) greater than the Si-to-Si distance in pure silicon. Next-nearest-neighbor distances are 3.85 \ifmmode\pm\else\textpm\fi{} 0.02 \AA{}, only 0.01 \AA{} (0.3%) greater than the corresponding Si-to-Si distance.
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