Publication | Closed Access
A ZnO/ZnMgO Multiple-Quantum-Well Ultraviolet Random Laser Diode
44
Citations
18
References
2010
Year
Optical MaterialsEngineeringLaser ApplicationsHigh-power LasersZno/znmgo Multiple-quantum-well UltravioletSemiconductor LasersCompound SemiconductorPhotonicsElectrical EngineeringPhotoluminescencePhysicsLaser DiodeAluminum Gallium NitrideCategoryiii-v SemiconductorSharp Lasing PeaksSolid-state LightingApplied PhysicsGan Power DeviceQuantum Photonic DeviceOptoelectronics
A ZnO/ZnMgO multiple-quantum-well ultraviolet (UV) random laser diode was fabricated on a commercially available n-type GaN wafer using a radio frequency magnetron sputtering system. The electroluminescence measurements revealed that the diode exhibited fairly pure UV random lasing centered at ~370 nm under sufficient forward bias at room temperature. The full-widths at half-maximum of the sharp lasing peaks are less than 0.4 nm. The device has a very low threshold current density of 4.7 A/cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> and extremely weak visible emission.
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