An atmospheric pressure plasma source

Jaeyoung Park, I. Henins, H. W. Herrmann, Gary S. Selwyn, James Jeong, Robert F. Hicks, Do-Sik Shim, C. S. Chang

Applied Physics Letters · 2000 · 221 citations · 10 references

Concepts

Abstract

An atmospheric pressure plasma source operated by radio frequency power has been developed. This source produces a unique discharge that is volumetric and homogeneous at atmospheric pressure with a gas temperature below 300 °C. It also produces a large quantity of oxygen atoms, ∼5×1015 cm−3, which has important value for materials applications. A theoretical model shows electron densities of 0.2–2×1011 cm−3 and characteristic electron energies of 2–4 eV for helium discharges at a power level of 3–30 W cm−3.

References

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