Publication | Closed Access
Transmission Electron Microscope Observation of “IR Scattering Defects” in As-Grown Czochralski Si Crystals
121
Citations
6
References
1996
Year
SemiconductorsMaterials ScienceEngineeringElectron MicroscopyCrystalline DefectsOptical PropertiesCrystal Growth TechnologyX-ray DiffractionCondensed Matter PhysicsApplied PhysicsWeak Oxygen SignalMicroanalysisDefect FormationCrystallographyIr LaserSio X
Grown-in defects detected by IR laser scattering tomography (LSTDs) in Czochralski-grown Si crystals were identified for the first time by transmission electron microscopy (TEM) with a special defect positioning technique. The basic structure of each LSTD was revealed to be a composite of two or three incomplete octahedral voids with a total size of 100–300 nm. The TEM images of the defects suggest the existence of walls several nanometers thick surrounding the voids. A weak oxygen signal was detected from the defect by energy dispersive X-ray spectrometry. The thin walls surrounding the voids were considered to be made of SiO x .
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