Publication | Closed Access

Characteristics of NiO–AZO thin films deposited by magnetron co-sputtering in an O2 atmosphere

Oxide HeterostructuresMagnetismMaterials ScienceThin Film PhysicsO2 AtmosphereEngineeringOxide ElectronicsSurface ScienceApplied PhysicsThin Film Process TechnologyNio–azo Thin FilmsThin FilmsChemical Vapor DepositionThin Film ProcessingMagnetron Co-sputtering