Capillary Force Lithography: Large-Area Patterning, Self-Organization, and Anisotropic Dewetting

Abstract

This article gives an overview on a new lithographic technique called capillary force lithography for large-area patterning. The technique simply involves placing a polydimethylsiloxane mold on a polymer film, which is then heated above the glass-transition temperature of the polymer. Various useful microstructures can be obtained by sequential applications of the technique through self-organization. Dewetting, which can be observed in capillary force lithography for relatively thin films, is also described as a new pathway for realizing anisotropic dewetting.