Science · 1992 · 52 citations · 23 references
Multiple-junction structures were formed, on a microscopic scale, at room temperature, by the application of a strong electric field across originally homogeneous crystals of the ternary chalcopyrite semiconductor CulnSe(2). After removal of the electric field, the structures were examined with electron beam-induced current microscopy and their current-voltage characteristics were measured. Bipolar transistor action was observed, indicating that sharp bulk junctions can form in this way at low ambient temperatures. The devices are stable under normal (low-voltage) operating conditions. Possible causes for this effect, including electromigration and electric field-assisted defect reactions, are suggested.
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P Shing Ho, T Kwok · Reports on Progress in Physics · 1989 · 810 citations
Engineering, Interconnect (Integrated Circuits), Electrometallurgy +16
Charge collection scanning electron microscopy
H. J. Leamy · Journal of Applied Physics · 1982 · 774 citations
Recombination enhanced defect reactions
Lionel C. Kimerling · Solid-State Electronics · 1978 · 421 citations
Mobility of Impurity Ions in Germanium and Silicon
C. S. Fuller, J. C. Severiens · Physical Review · 1954 · 315 citations