Metal organic vapor phase epitaxy growth of single crystalline GaN on planar Si(211) substrates

Abstract

We present metal organic vapor phase epitaxy growth of polarization reduced, wurtzitic gallium nitride layers with an 18° inclination of the c-axis to the surface normal on planar Si(211) substrates. The growth of this layer is performed as c-axis oriented growth on the naturally occurring Si(111) planes of the Si(211) substrate. Cathodoluminescence measurements on a ∼1.2 μm thick structure reveals that it has a low concentration of basal plane stacking faults and no prismatic stacking fault luminescence.