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A graded-index waveguide separate-confinement laser with very low threshold and a narrow Gaussian beam
167
Citations
12
References
1981
Year
EngineeringSymmetric Laser StructureLaser ApplicationsLaser MaterialOptoelectronic DevicesHigh-power LasersSemiconductorsSemiconductor LasersOptical PropertiesGuided-wave OpticMolecular Beam EpitaxyEpitaxial GrowthCompound SemiconductorPhotonicsOptoelectronic MaterialsLow ThresholdNarrow Gaussian BeamPhotonic DeviceElectro-optics DeviceApplied PhysicsHeterostructure Semiconductor LaserMultilayer HeterostructuresOptoelectronics
A heterostructure semiconductor laser with graded-index waveguide and separate carrier and optical confinements prepared by molecular beam epitaxy is discussed. These lasers have very low broad-area threshold current densities Jth 500 A/cm2 and support narrow beams of Gaussian distribution with far-field half-power full-width in the direction perpendicular to the junction plane ϑ⊥ ∼20°–30°. It is also shown that only when the active layer thickness is ≲700 Å a significantly lower Jth is obtained by employing the symmetric laser structure instead of the regular double heterostructure.
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