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Phase transitions in [001]-oriented morphotropic PbZr0.52Ti0.48O3 thin film deposited onto SrTiO3-buffered Si substrate
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Citations
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References
2014
Year
Phase TransitionsEngineeringPiezoelectric Pzt FilmsSilicon On InsulatorNm-thick Morphotropic Pbzr0.52ti0.48o3Ferroelectric ApplicationSrtio3-buffered Si SubstratePiezoelectric MaterialMolecular Beam EpitaxyEpitaxial GrowthThin Film ProcessingMaterials ScienceMaterials EngineeringCrystalline DefectsSemiconductor MaterialPiezoelectricitySurface ScienceApplied PhysicsCondensed Matter PhysicsThin Films
An 85 nm-thick morphotropic PbZr0.52Ti0.48O3 (PZT) film grown epitaxially and [001]-oriented onto a SrTiO3-buffered Si-wafer is investigated using temperature dependent X-ray diffraction. Two phase transitions, at Trt ∼ 500 K and Tc ∼ 685 K, are evidenced and are attributed to structural phase transitions from monoclinic-like to tetragonal-like phase and from tetragonal to paraelectric phase, respectively. The stronger upper shift of Trt value with respect to the bulk one and the weakly affected Tc (Tc bulk ∼ 665 K) are explained assuming misfit strain changes when crossing Trt. This finding opens new perspectives for piezoelectric PZT films in harsh applications.
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