Publication | Closed Access
Growth of SiO2 films by TEOS-PECVD system for microelectronics applications
47
Citations
10
References
2003
Year
Materials ScienceElectrical EngineeringEpitaxial GrowthEngineeringOxide ElectronicsSurface ScienceApplied PhysicsThin FilmsMicroelectronicsSio2 FilmsChemical Vapor DepositionThin Film Processing
| Year | Citations | |
|---|---|---|
Page 1
Page 1