Publication | Closed Access
Some properties of very thin Bi <sub>2</sub> Te <sub>3</sub> layers prepared by laser ablation
13
Citations
12
References
2003
Year
Optical MaterialsEngineeringLaser PhysicsLaser ApplicationsLaser AblationLaser MaterialHigh-power LasersSemiconductorsOptical PropertiesPulsed Laser DepositionMaterials SciencePhysicsBi2te3 60Krf Excimer LaserLaser Processing TechnologyLaser-assisted DepositionAdvanced Laser ProcessingApplied PhysicsThin FilmsLaser-surface Interactions
Thin layers of Bi2Te3 60 nm thickness were prepared by laser ablation in vacuum using KrF excimer laser. The energy of laser varied from 300 to 680 mJ and the laser energy density from 2 to 10 J cm–2. The substrate temperature varied for different depositions in the interval of 20–500 °C. The influence of preparation conditions on Hall mobility, concentration of charge carriers and conductivity at room temperature is presented. Information about morphology and composition of prepared layers is given.
| Year | Citations | |
|---|---|---|
Page 1
Page 1