Publication | Closed Access
Barrier properties of TiN/TiSi2 bilayers formed by two-step rapid thermal conversion process for Cu diffusion barrier
12
Citations
13
References
1999
Year
Materials ScienceEngineeringPhysicsSurface ScienceApplied PhysicsTin/tisi2 BilayersBarrier PropertiesCu Diffusion BarrierSemiconductor MaterialLayered MaterialChemical Vapor Deposition
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