Effect of low-frequency power on dual-frequency capacitively coupled plasmas

Abstract

In low-pressure dual-frequency capacitively coupled plasmas driven with 60/13.56 MHz, the effect of low-frequency power on the plasma characteristics was investigated using a compensated Langmuir electrostatic probe. At lower pressures (about 10 mTorr), it was possible to control the plasma density and the ion bombardment energy independently. As the pressure increased, this independent control could not be achieved. As the low-frequency power increased for the fixed high-frequency power, the electron energy probability function (EEPF) changed from Druyvesteyn-like to Maxwellian-like at pressures of 50 mTorr and higher, along with a drop in electron temperature. The plasma parameters were calculated and compared with simulation results.