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Depth-dependent etch pit density in Ge epilayer on Si substrate with a self-patterned Ge coalescence island template

Materials ScienceMaterials EngineeringSi SubstrateEpitaxial GrowthEngineeringNanoelectronicsSurface ScienceApplied PhysicsGe EpilayerSemiconductor Device FabricationMolecular Beam EpitaxySilicon On InsulatorMicroelectronicsPlasma Etching