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Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications

Materials ScienceMagnetismMagnetic PropertiesEngineeringMagnetic Data StorageUltra-thin Ta-c FilmsApplied PhysicsMicrostructure CharacteristicsMagnetic DeviceMagnetic MaterialMagnetic MaterialsMagnetic Medium