Publication | Closed Access
<i>p</i>-<i>n</i> junction formation in InSb and InAs1−<i>x</i>Sb<i>x</i> by metalorganic chemical vapor deposition
85
Citations
10
References
1985
Year
EngineeringP-n JunctionsOptoelectronic DevicesChemistrySemiconductor DeviceSemiconductor NanostructuresSemiconductorsElectronic DevicesQuantum MaterialsSoft BreakdownCompound SemiconductorMaterials ScienceSemiconductor TechnologyElectrical EngineeringCrystalline DefectsSemiconductor MaterialElectronic MaterialsSurface ScienceApplied PhysicsCondensed Matter PhysicsTernary AlloyOptoelectronics
p-n junctions have been fabricated in InSb and InAs1−xSbx (0.4&lt;x&lt;0.7) using metalorganic chemical vapor deposition. These junctions showed soft breakdown in addition to forward characteristics with a diode factor greater than 2. The ternary alloy has a cut-off wavelength in the 8–11-μm range, thus providing a potential material system for detectors covering the 8–12-μm range.
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