Journal of Electronics and Control · 1959 · 27 citations · 9 references
SemiconductorsSemiconductor TechnologyElectrical EngineeringIon ImplantationEngineeringEffective Ionization CoefficientPhysicsSemiconductor DeviceIntrinsic ImpurityApplied PhysicsTime-dependent Dielectric BreakdownAvalanche Breakdown PhenomenaIon EmissionEffective Ionization CoefficientsElectrical InsulationSilicon Pn Junctions†
ABSTRACT Some useful empirical relationships on the variation of effective ionization coefficients associated with the avalanche breakdown phenomena in pn junctions are derived from measurements on silicon alloy junctions, in the range of impurity concentrations of the basic material from 5 × 1013/cm3 to 10l8/cm3. These results show that for electric field strengths from 1.5 × 203 v/ cm to 3 × 105 v /cm the effective ionization coefficient is equal to 18E7; from 3 × 10 7 v/cm to 6 × 105 v/cm it is of the form 2.7 × 10 5 exp–(6.45/E) and for values greater than 6 × 105 v/cm the effective ionization coefficient tends to E 105/5 where in all cases E is measured in units of 105 v/cm. Some discussion is given on the compatibility of calculations of ionization coefficients derived from breakdown measurements and those from multiplication measurements.
9
Ionization Rates for Electrons and Holes in Silicon
A. G. Chynoweth · Physical Review · 1958 · 574 citations
Avalanche Breakdown in Silicon
K. G. McKay · Physical Review · 1954 · 478 citations
Electrical Engineering, Semiconductor Device, Engineering +13
Avalanche Breakdown in Germanium
S. L. Miller · Physical Review · 1955 · 373 citations
Mobility of Holes and Electrons in High Electric Fields
Elaine Ryder · Physical Review · 1953 · 355 citations
Semiconductors, Engineering, Physics +14