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Ionization Rates for Electrons and Holes in Silicon
574
Citations
7
References
1958
Year
Field DependenceIon ImplantationEngineeringPhysicsIonization RatesApplied PhysicsAtomic PhysicsSemiconductor MaterialsSemiconductor Device FabricationSilicon On InsulatorIon EmissionIonization RateSemiconductor Device
The ionization rates for holes and electrons in silicon have been determined over the following ranges of field: for holes, (2.5-6.0)\ifmmode\times\else\texttimes\fi{}${10}^{5}$ volts ${\mathrm{cm}}^{\ensuremath{-}1}$; for electrons, (2.0-5.0)\ifmmode\times\else\texttimes\fi{}${10}^{5}$ volts ${\mathrm{cm}}^{\ensuremath{-}1}$. The ionization rate for electrons is higher than that for holes. The results suggest that the field dependence of the ionization rate for holes and, probably, for electrons also, can be expressed by $a\mathrm{exp}(\ensuremath{-}\frac{b}{E})$, where $E$ is the field. The constants $a$ and $b$ are different for electrons and holes.
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