Publication | Closed Access
Combined Theoretical and Experimental Study of Band-Edge Control of Si through Surface Functionalization
64
Citations
27
References
2013
Year
EngineeringChemistrySilicon On InsulatorSemiconductorsWafer Scale ProcessingElectron SpectroscopyNanoelectronicsSiliceneElectrical EngineeringPhysicsPhysical ChemistrySemiconductor Device FabricationQuantum ChemistryBand-edge PositionsSurface CharacterizationElectronic MaterialsIp ValuesMicrofabricationSurface ChemistryNatural SciencesSurface ScienceApplied PhysicsSurface FunctionalizationSurface AnalysisExperimental StudyBand-edge ControlSurface Reactivity
The band-edge positions of H-, Cl-, Br-, methyl-, and ethyl-terminated Si(111) surfaces were investigated through a combination of density functional theory (DFT) and many-body perturbation theory, as well as by photoelectron spectroscopy and electrical device measurements. The calculated trends in surface potential shifts as a function of the adsorbate type and coverage are consistent with the calculated strength and direction of the dipole moment of the adsorbate radicals in conjunction with simple electronegativity-based expectations. The quasi-particle energies, such as the ionization potential (IP), that were calculated by use of many-body perturbation theory were in good agreement with experiment. The IP values that were calculated by DFT exhibited substantial errors, but nevertheless, the IP differences, i.e., IPR–Si(111)–IPH–Si(111), computed using DFT were in good agreement with spectroscopic and electrical measurements.
| Year | Citations | |
|---|---|---|
Page 1
Page 1