Publication | Closed Access
Irreversible altering of crystalline phase of phase-change Ge–Sb thin films
15
Citations
18
References
2010
Year
Materials ScienceOptical MaterialsEngineeringGe–sb Crystalline StructureCrystalline DefectsCrystalline PhaseOptical PropertiesCrystal Growth TechnologyCrystal MaterialApplied PhysicsCondensed Matter PhysicsThin Film Process TechnologyThin FilmsMolecular Beam EpitaxyEpitaxial GrowthThin Film ProcessingGe Content
The stability of the crystalline phase of binary phase-change GexSb1−x films is investigated over a wide range of Ge content. From Raman spectroscopy we find the Ge–Sb crystalline structure irreversibly altered after exposure to a laser beam. We show that with increasing beam intensity/temperature Ge agglomerates and precipitates out in the amount growing with x. A simple empirical relation links Ge precipitation temperature TGep to the rate of change dTcryst/dx of crystallization, with the precipitation easiest on the mid-range x plateau, where Tcryst is nearly constant. Our findings point to a preferable 15%≲x≲50% window, that may achieve the desired cycling/archival properties of a phase-change cell.
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