Investigations of the reaction between CH₂(X³B₁) and O₂ in the temperature range 233 K ≤ <i>T</i> ≤ 433 K

Abstract

Abstract The reaction between CH 2 (X̃T 3 B 1 ) radicals ( 3 CH 2 ) and O 2 3 CH 2 +O 2 →products, has been studied in a discharge flow reactor with Laser Magnetic Resonance (LMR) detection of 3 CH 2 and OH radicals and Electron Spin Resonance detection of O and H atoms. From the measured concentration‐versus‐time profiles of [ 3 CH 2 ] in the absence and presence of a large excess of O 2 the overall rate coefficient of the reaction was found to be magnified image In the temperature range 233 K ≤ T ≤ 433 K. A limit for the contribution of H atom forming reaction channels of &lt;20% was determined. The results are discussed in relation to available literature data on the formation of stable products. Main reaction channels leading directly to production of CO + H 2 O and H 2 + CO 2 are concluded to be of importance.