Publication | Open Access
Performance measurements at the SLS SIM beamline
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2010
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Optical MaterialsEngineeringElectron-beam LithographyMicroscopyComputer ArchitectureElectron OpticSls Sim BeamlineOptical PropertiesSystems EngineeringModeling And SimulationInstrumentationLight MicroscopyVariable PolarizationNanophotonicsSwiss Light SourcePerformance PredictionPhotonicsHardware-in-the-loop SimulationPhysicsComputer EngineeringApplied PhysicsMicroscopy BeamlineBeamforming
The Surface/Interface: Microscopy beamline of the Swiss Light Source started operation in 2001. In 2007 the beamline has been significantly upgraded with a second refocusing section and a blazed grating optimized for high photon flux. Two Apple II type undulators with a plane grating monochromator using the collimated light scheme deliver photons with an energy from 90eV to about 2keV with variable polarization for the photoemission electron microscope (PEEM) as the primary user station. We measured a focus of (45×60) μm(ν×h) and a photon flux > 1012 photon/s for all gratings. Polarization switching within a few seconds is realized with the small bandpass of the monochromator and a slight detuning of the undulator.