High carrier mobility in orientation-controlled large-grain (≥50 <i>μ</i>m) Ge directly formed on flexible plastic by nucleation-controlled gold-induced-crystallization

Abstract

High-carrier-mobility semiconductors on flexible-plastic are essential to realize flexible electronics. For this purpose, electrical properties of orientation-controlled large-grain Ge crystals on flexible-plastic directly formed by nucleation-controlled gold-induced-crystallization (GIC) are examined, and compared with those obtained by aluminum-induced-crystallization (AIC). The Ge crystals show p-type conductions. Here, hole concentrations are 2.2 × 1017 and 5.8 × 1020 cm−3 for GIC-Ge and AIC-Ge, respectively, which are explained on the basis of the solubility of Au and Al in Ge. Thanks to the low hole concentration, GIC-Ge shows high hole mobility (160 cm2 V−1 s−1) compared with AIC-Ge (37 cm2 V−1 s−1). These demonstrate significant advantage of GIC to realize high-performance flexible-electronics.