Systematic Study of the Effect of Disorder on Nanotribology of Self-Assembled Monolayers

Michael Chandross, Edmund B. Webb, Mark J. Stevens, Gary S. Grest, Stephen H. Garofalini

Physical Review Letters · 2004 · 89 citations · 18 references

Concepts

Abstract

The adhesion and friction between pairs of ordered and disordered self-assembled monolayers on SiO2 are studied using molecular dynamics. The disorder is introduced by randomly removing chains from a well ordered crystalline substrate and by attaching chains to an amorphous substrate. The adhesion force between monolayers at a given separation increases monotonically with chain length at full coverage and with coverage for fixed chain length. Friction simulations are performed at shear velocities between 0.02-2 m/s at constant applied pressures between 200 and 600 MPa. Stick-slip motion is observed at full coverage but disappears with disorder. With random defects, the friction becomes insensitive to chain length, defect density, and substrate.

References

18