Publication | Closed Access
Metalorganic vapor phase epitaxy of low-resistivity <i>p</i>-type ZnSe
207
Citations
11
References
1988
Year
Materials EngineeringMaterials ScienceSemiconductorsElectronic DevicesElectrical EngineeringLowest ResistivityGaas SubstratesEngineeringIi-vi SemiconductorSemiconductor TechnologyOptoelectronic MaterialsApplied PhysicsSemiconductor MaterialsZnse P-n DiodesOptoelectronic DevicesMolecular Beam EpitaxyEpitaxial GrowthCompound Semiconductor
Low-resistivity p-type ZnSe layers have been successfully grown on GaAs substrates by metalorganic vapor phase epitaxy with the use of dimethylzinc and diethylselenide as source materials and lithium nitride as the dopant. The lowest resistivity achieved is 0.2 Ω cm, and the highest carrier concentration is 9×1017 cm−3. ZnSe p-n diodes fabricated by this technique have shown blue emission; the spectral peak is located at 467 nm.
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