Publication | Closed Access
High deposition rate of epitaxial (100) Iridium film on (100)YSZ/(100)Si substrate by RF sputtering deposition
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Citations
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References
2002
Year
Materials ScienceMaterials EngineeringSi SubstrateEpitaxial GrowthEngineeringIridium FilmApplied PhysicsChemical DepositionPulsed Laser DepositionMolecular Beam EpitaxyHigh Deposition RateOptoelectronicsChemical Vapor Deposition
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