Publication | Closed Access
Low pressure synthesis of bulk, polycrystalline gallium nitride
54
Citations
8
References
1997
Year
Materials ScienceAluminium NitrideEngineeringLow Pressure SynthesisApplied PhysicsAluminum Gallium NitrideHigh Pressure N2Liquid GalliumGallium OxideGan Power DeviceBulk GanChemistryCategoryiii-v SemiconductorOptoelectronicsMicrostructure
Thick films of polycrystalline GaN were grown at low pressures by direct reaction of atomic nitrogen with liquid Ga without the presence of a substrate. The crystals were confirmed to be wurtzitic GaN by x-ray diffraction, transmission electron microscopy, Raman spectroscopy, and elemental analysis. Photoluminescence spectra showed near band edge peaks and broad yellow band emission at both 298 and 10 K. The results show that atomic nitrogen is an attractive alternative to high pressure N2 for the saturation of liquid gallium with nitrogen for the synthesis of bulk GaN.
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