Surface amorphization, sputter rate, and intrinsic stresses of silicon during low energy Ga+ focused-ion beam milling - Concepedia

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Surface amorphization, sputter rate, and intrinsic stresses of silicon during low energy Ga+ focused-ion beam milling

DOI Full Paper Access

51

Citations

23

References

2009

Year

Lars Pastewka, Roland Salzer, Andreas Graff, Frank Altmann, Michael Moseler

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms

Materials ScienceIon ImplantationEngineeringMicrofabricationApplied PhysicsSemiconductor Device FabricationIon BeamIntrinsic StressesSurface AmorphizationSilicon On InsulatorSputter RateMicrostructure

References

	Year	Citations

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