Aluminum-doped zinc oxide formed by atomic layer deposition for use as anodes in organic light emitting diodes

Abstract

Aluminum-doped zinc oxide films produced by atomic layer deposition were investigated for use as anodes in organic light emitting diode (OLED) devices. Al-doped ZnO (AZO) films (∼200 nm thick) were deposited at temperatures of 200, 230, and 260 °C and the AZO film deposited at 260 °C demonstrated carrier mobility, carrier concentration, resistivity, and transmittance values of 16.2 cm2 V−1 s−1, 5.18 × 1020 cm−3, 7.34 × 10−4 Ω cm, and 90%, respectively. OLED devices with a DNTPD/TAPC/Bebq2:10% doped RP-411/Bphen/LiF/Al structure on a glass substrate fabricated using an AZO anode formed at 260 °C showed turn-on voltage, maximum luminance, and current efficiency values of 5.3 V, 16680 cd/m2, and 4.8 cd/A, respectively.