1-μs laser pulses from XeF

L. F. Champagne, J. G. Eden, N. W. Harris, N. Djeu, S. K. Searles

Applied Physics Letters · 1977 · 54 citations · 6 references

Concepts

Abstract

Long-pulse operation of the XeF laser has been achieved utilizing electron beam excitation of Ar/Xe/NF3 gas mixtures. For a total mixture pressure of 2.5 atm, ∼0.30 J of 350-nm radiation was obtained in a 1-μs FWHM pulse.

References

6