Publication | Closed Access
Overview of Coating Growth Mechanisms in MOCVD Processes as Observed in Pt Group Metals
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Citations
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References
2007
Year
EngineeringAbstract RhodiumChemistryChemical DepositionMocvd ProcessesElectron MicroscopyCorrosionMetal-organic PolyhedronPt Group MetalsThin Film ProcessingMaterials EngineeringMaterials ScienceInorganic ChemistrySurface CharacterizationSurface ChemistrySurface ScienceApplied PhysicsMaterials CharacterizationStructural ChangesCoating Growth MechanismsChemical Vapor Deposition
Abstract Rhodium, palladium, iridium, and platinum are deposited by means of metal‐organic (MO)CVD using metal beta‐diketonates as precursors. Under some conditions, the microstructure of the deposited metals changes from compact to columnar. The potential causes of structural changes are investigated and a mechanism of contamination is proposed, based on the observation of growth singularities. Several Rh, Pd, Ir, and Pt coatings are analyzed using scanning electron microscopy (SEM), transmission electron microscopy (TEM), high‐resolution (HR)TEM, energy dispersive X‐ray (EDX), and Gratan™ image filter (GIF) in order to observe composition, structure, and to identify the source of eventual structural changes.
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