IEEE Transactions on Applied Superconductivity · 1993 · 15 citations · 19 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesThin FilmsChemical Vapor DepositionSemiconductor Device MaterialsSemiconductor Thin FilmsSuperconducting MaterialsSuperconducting Thin FilmsThin-film DepositionChemical Vapor Deposition MaterialsHigh-temperature Superconducting FilmsHigh-temperature SuperconductorsMetalorganic Chemical Vapor DepositionSuperconducting CeramicsSuperconducting PropertiesThin-film SuperconductorsYttrium Barium Copper Oxide Films
Rapid-isothermal processing (RIP)-assisted metalorganic chemical vapor deposition (MOCVD) has been used for the deposition of high-quality films of YBa/sub 2/Cu/sub 3/O/sub 7/ (YBCO) on insulating substrates at temperatures as low as 610 degrees C. The results of processing and characterization of YBCO films deposited on bulk gold foils and Au/Si substrates by RIP-assisted MOCVD are reported. By the use of YBCO/Au foils, improvement in the performance of Au/YBCO/n-Si Schottky diodes operating at 50 K is achieved.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
19
Rajendra Singh · Journal of Applied Physics · 1988 · 287 citations
Sr2RuO4: A metallic substrate for the epitaxial growth of YBa2Cu3O7−δ
F. Lichtenberg, A. Catana, J. Mannhart et al. · Applied Physics Letters · 1992 · 131 citations
Some photoeffect roles in rapid isothermal processing
Rajendra Singh, Santanu Sinha, R. P. S. Thakur et al. · Applied Physics Letters · 1991 · 62 citations
Natural Sciences, Materials Engineering, Materials Science +17