Development of a diffusion barrier layer for silicon and carbon in molybdenum—a physical vapor deposition approach - Concepedia

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Development of a diffusion barrier layer for silicon and carbon in molybdenum—a physical vapor deposition approach

13

Citations

11

References

1999

Year

S. Govindarajan, John J. Moore, J. Disam, C. Suryanarayana

Metallurgical and Materials Transactions A

Materials ScienceMaterials EngineeringDiffusion Barrier LayerEngineeringSurface ScienceApplied PhysicsSemiconductor MaterialSemiconductor Device FabricationChemical DepositionSilicon On InsulatorChemical Vapor Deposition

References

	Year	Citations

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