Publication | Closed Access
3p-3d intershell interaction in Cr
48
Citations
15
References
1980
Year
Engineering3D Modeling3P-3d Intershell InteractionPhoto-electrochemical CellComputer-aided DesignIi-vi SemiconductorPhoton Energy Range3D User Interaction3D Ic ArchitecturePhotoluminescencePhysicsPhotochemistryPhysical ChemistryPhotoelectric MeasurementQuantum ChemistryCr FilmsNatural SciencesApplied PhysicsThin FilmsOptoelectronics
The photoemission of Cr films deposited under UHV conditions has been investigated in the photon energy range from 30 eV to 230 eV. The 3p-3d intershell interaction gives rise to a strong maximum in the 3d partial yield above the 3p threshold.
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