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Strain relief study concerning the In<i>x</i>Ga1−<i>x</i>As/GaAs (0.07&lt;<i>x</i>&lt;0.5) material system
46
Citations
12
References
1991
Year
Wide-bandgap SemiconductorEngineeringSemiconductorsStrain Relief StudyQuantum MaterialsStressstrain AnalysisGaas MaterialEpitaxial GrowthMaterials SciencePhysicsCrystalline DefectsDefect FormationMicrostructureDislocation InteractionDislocation EvolutionApplied PhysicsCondensed Matter PhysicsTernary Alloy ComparisonMechanics Of MaterialsHigh Strain Rate
The evolution of dislocations in the InxGa1−xAs/GaAs material system has been studied as a function of the ternary alloy comparison in the range 0.07&lt;x&lt;0.5. Cross-sectional transmission electron microscope observations indicate that for x&lt;0.18, threading dislocations are absent in the epilayer and dislocations propagate from the heterointerface into the GaAs material, while, for 0.18&lt;x&lt;0.28, dislocations appear to propagate into both the epilayer and the GaAs. Furthermore, for x ≳0.28, all the dislocations are observed in the epilayer while the GaAs appears to be dislocation-free. We propose a model involving the balance of forces acting on misfit dislocations generated at the heterointerface which includes a surface image force term to explain our observations of dislocation evolution as a function of the ternary alloy composition.
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