Publication | Closed Access
Interfacial oxide determination and chemical/electrical structures of HfO2/SiOx/Si gate dielectrics
21
Citations
7
References
2004
Year
Materials ScienceElectrical EngineeringEngineeringOxide ElectronicsInterfacial Oxide DeterminationApplied PhysicsTime-dependent Dielectric BreakdownSemiconductor Device FabricationSilicon On InsulatorSemiconductor Device
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