Grazing Exit X-Ray Fluorescence Spectroscopy for Thin-Film Analysis

Abstract

Under the grazing exit condition, X-ray fluorescence (XRF) experiments have been performed for metal thin films (Cu, Ni) on glass substrates. The XRF intensity was measured as a function of the exit angle for nearly normal X-ray incidence. The angular dependence of the grazing exit XRF intensity showed a sharp increase at the critical angle of K α radiation for the metal film. A three-media model was used to calculate the angular dependence of the XRF intensity. The effects of the film thickness on the XRF intensity curve were also discussed. The applicability of the grazing exit XRF for thin-film analysis was clearly demonstrated.