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Mid Wavelength Type II InAs/GaSb Superlattice Photodetector Using SiO<sub>x</sub>N<sub>y</sub> Passivation
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Citations
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References
2012
Year
SemiconductorsPhotonicsElectrical EngineeringOptical MaterialsEngineeringWide-bandgap SemiconductorPhotodetectorsPhysicsMid WavelengthSemiconductor TechnologyPhotoluminescenceApplied PhysicsSio X NPhotodetector StructurePhotoelectric MeasurementOptoelectronic DevicesOptoelectronicsCompound Semiconductor
We report on a mid wavelength (MW) type II InAs/GaSb superlattice (SL) photodetector structure using SiO x N y as the passivation material. The 50% cutoff wavelength of the photoresponse is 4.8 µm at 77 K. R 0 A , the resistance-and-area product at zero bias, is 2.1×10 3 Ω·cm 2 for the device with the SiO x N y passivation, which is about 13 times larger than that without the passivation. Our result indicates SiO x N y passivation is an effective way to reduce the shunt current for MW InAs/GaSb SL photodetector.
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