Internal stress and adhesion of Cu film/Si prepared by both MEVVA and IBAD

Transition metals in silicon

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A simple model for the formation of compressive stress in thin films by ion bombardment

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H. Windischmann · Critical reviews in solid state and materials sciences/CRC critical reviews in solid state and materials sciences · 1992 · 644 citations

Natural Sciences, Materials Engineering, Materials Science +14

An intrinsic stress scaling law for polycrystalline thin films prepared by ion beam sputtering

H. Windischmann · Journal of Applied Physics · 1987 · 401 citations

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Silicides and ohmic contacts

J. Gambino, E. G. Colgan · Materials Chemistry and Physics · 1998 · 389 citations

Natural Sciences, Materials Science, Physics +7