Crystallization process of high-k gate dielectrics studied by surface X-ray diffraction - Concepedia

Concepedia

Publication | Closed Access

Crystallization process of high-k gate dielectrics studied by surface X-ray diffraction

18

Citations

6

References

2005

Year

N. Terasawa, K. Akimoto, Yota Mizuno, A. Ichimiya, K. Sumitani, Toshio Takahashi, X.W. Zhang, Hiroshi Sugiyama, Hiroshi Kawata, Toshihide Nabatame,

Applied Surface Science

Materials EngineeringMaterials ScienceEngineeringSurface X-ray DiffractionCrystal Growth TechnologyX-ray DiffractionApplied PhysicsSemiconductor MaterialEpitaxial GrowthHigh-k Gate DielectricsCrystallographyCrystallization Process

References

	Year	Citations

Page 1

Page 1