Journal of Applied Physics · 1965 · 45 citations · 13 references
EngineeringMaterials EngineeringMaterials ScienceMaterials ChemistryPhysical ChemistryRadiation PhysicsDefects In Electronic MaterialsDopingRadiation Damage In MaterialsRadiation HardeningRadiation Transport In MatterElectron Beam Irradiation EffectsFlow StressImpuritiesImpurity StatesInterstitialsIrradiation EffectsIrradiation Effects On MaterialsRadiation-induced Hardening
Measurements of flow stress and F-band coloration have been made at room temperature on a number of ``pure'' and impurity-doped KCl crystals as a function of gamma and electron irradiation. As has been observed, the flow stress increase, for late-stage coloration, is proportional to the square root of the F-band absorption. However, it is found that the early-stage coloration does not contribute to the radiation hardening. These results suggest that the late-stage production mechanism for F centers involves interstitial formation and clustering, whereas no stable interstitials are formed during early-stage coloration. Moreover, even though it is known that certain impurities enhance early-stage coloration, it is found that the concentration of early-stage F centers is only a small percentage of the total impurity concentration. This suggests that only isolated positive-ion vacancies are involved in the F-center production mechanism for this stage.
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