Publication | Closed Access
Atomic structure of [011] and [001] near-coincident tilt boundaries in germanium and silicon
114
Citations
16
References
1984
Year
EngineeringMicroscopyElectron DiffractionSilicon On InsulatorElectronic StructureSecondary RelaxationsElectron MicroscopyAtomic StructureSiliceneMaterials SciencePhysicsCrystalline DefectsGrain BoundaryAtomic PhysicsMicroanalysisGrain Boundary AppearCrystallographyMicrostructureCondensed Matter PhysicsApplied PhysicsElectron Microscope
Abstract High resolution electron microscopy (HREM) has been used to investigate the structure of [001] and [011] pure tilt grain boundaries, both near-coincident and coincident, in crystals of Ge and Si. The resolution limit for the detection of the rigid body translation using HREM has been established, and compared with the α-fringe technique. Several structural units for primary and secondary relaxations have been found; it is shown that the core extension of a secondary relaxation covers one primary period. Likewise, a detailed comparison between simulated and experimental images for a σ = 9 grain boundary is presented. Some atomic sites in the period of the grain boundary appear to be preferentially attacked by impurities.
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